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ASAP start to produce auto mask aligner.

2013-10-28

ASAP have developed auto mask aligner.

This machine can adjust the parallelism between wafer stage and photomask automatically with high accuracy. The gap can be controlled without any contact with mask, so it prevent the damage to mask and high yeild.

Wafer handling system is same as our main products coater and developer design. It makes the low price and stability real.

ASAP start to produce new type machine which integrate coater, developer and liftoff.

2013-08-08

3 kinds of our main product ( coater,developer and liftoff ) are integrated in one machine.  We know engineer working in R&D department wants to process effectively and stably by using automatic process equipment.

Our new product realize it at low cost ! ! !

Liftoff unit can be used resist removing and organic solvent cleaning process too.

SEMICON JAPAN2012

2012-11-22

We participate in SEMICON JAPAN2012.(2012.12.5-12.7 at Makuhari-Messe)

Our booth No. is 3A-201. We exhibit actual machine of <Mask Aligner> that is 2/3-compacted compare with in the past. Also introduce our main products; Coater / Developer / Liftoff Machine by movie.

We are looking forward to your coming.

ASAP start real-time support service using Skype

2012-11-13

ASAP start real-time support service using Skype. It will be possible shorten the down time of machine.

Do you have such exprience that take much time to recover the minor trouble?

Only pictures and voice calls can’t be reported the situation correctry.

It takes a long time by the exchange of e-mail.

We provide the free support service that can solve such as trouble support issue by using Skype.

For details, please contact us here→http://www.asap-semi.co.jp/en-contact

Website was renewed.

2012-06-11

Website was renewed.

We moved

2012-04-01

ASAP has moved to the following new location:

27-1 Sanjomachi, Nishi-Ku, Saitama-City, SAITAMA  331-0056
TEL: +81 48-871-8305 FAX: +81 48-871-8306

We moved


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